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 论文编号：
lw200708151139186453 |
| 论文属性：
Courswork |
| 论文语言：English |
| 论文国家：U.K. |
| 登出日期： 2007-08-15 |
| 字数： 2000 |
| 源程序：
无 |
| 价格：
100 |
| 注明： |
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| 论文大纲，目录 |
| 关键词搜索：Atomic Force Microscopy Nanolithography Silicon Colloidal Au Nanoparticles |
Atomic Force Microscopy-Based Nanolithography on Silicon Using Colloidal Au Nanoparticles As a Nanooxidation Mask
Introduction
Atomic force microscopy (AFM) lithography has attracted
much attention for its nanometer-scale surface
structuring capability. The basic strategy of AFM lithography
is to utilize the spatially localized force or electric
field generated by the AFM tip to induce a physical or
chemical change on surfaces. Mamin et al.,1 Bouchiat and
Esteve,2 and others have demonstrated the formation of
nanopits and grooves on soft polymer surfaces by AFMbased
mechanical indentation or scratching.
arrays on solid surfaces. These arrays can be used as the
coulomb islands in the study of room-temperature singleelectron
tunneling,13,14 as nanoelectrodes for electrochemical
studies,15 as active substrates in surface-enhanced
Raman scattering (SERS),16 etc. Recently, Ahmed et al.
reported that the gold colloidal nanoparticles could be
utilized as reactive ion etching (RIE) masks for the
fabrication of silicon nanopillars.17 The diameter of a pillar
is directly determined by the nanoparticle size. These
investigators have succeeded in making nanopillars as
small as 5 nm in diameter.
In this letter, we present a novel use of colloidal gold
nanoparticles inAFMnanolithography. The nanoparticles
are immobilized on a mercaptopropyltriethoxysilane
(MPTS)-modified silicon surface via Au-S chemical
bonding and are exploited as the lithographic mask to
pre英语论文网 【http://www.51lunwen.org】vent the covered area from AFM tip-induced nanooxidation
of MPTS and silicon. By combining this approach
with the wet chemical etching, we demonstrate the
feasibility of fabricating large-area silicon nanocolumns
with a simple one-raster scanning of an AFM tip.
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