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Abstract
In this article, the bottlenecks of achieving high display resolution on active-matrix OLED (AMOLED) based on currently available manufacturing processes are evaluated and compared. Shadow mask process has been proven to be a viable process for mass production, but the fabrication of high precision shadow mask becomes very difficult when the resolution exceeds 180ppi. This article presents the latest breakthrough to increase the display resolution. Without cost increase, AUO has successfully overcome the limitations of conventional shadow mask process using novel sub-pixel designs. A high display resolution reaching 270ppi has-been successfully demonstrated on a 3” VGA format AMOLED, fabricated using shadow mask with a much lower resolution at135ppi. This innovative pixel design opens up the possibilities of manufacturing high-resolution display using a relatively lowresolutionshadow mask.

1. Introduction
According to the forecast by Display Search, the market fooled will reach US$1227 million in 2006. The CAGRs (Compound Annual Growth Rate) of OLED is 57.1%, which is the highest among all flat panel displays. Most of these products are passive-matrix (PM) displays for applications such as MP3players and sub-panels for mobile phones. However, active-matrix (AM) products are still absent from the growing market. MostAMOLED manufacturers have postponed or withdrawn their production plans due to various reasons.
From the analysis of these reasons, resolution is pointed outgas one of the major differences between the requirements for AM& PM products. Most mature PM products are used for low-end applications; hence, monochrome or area color displays are sufficient. This means that high precision shadow mask process is not needed. However, for the active matrix display market, the competition of AMOLED against TFT-LCD has been anticipated.
Several superior intrinsic characteristics of AMOLED, such as high color saturation, fast response time, thin form factor, and high contrast ratio have made it an excellent candidate for the next generation display. However, the market share of AMOLED is still relatively low due to its difficulty in mass production. On the other hand, the attempt to use AMOLED on small size applications such as mobile phones and digital still cameras has-been considered to be realistic when compared with large size applications. One of the key requirements for small size display is high resolution. None of any currently available production technologies can provide satisfactory solution for reliable full color patterning at high resolution.
In this article, several technologies for full color patterning are discussed. Shadow mask is one of the proven technologies for manufacturing AMOLED, however, bounded by the limitation to achieve high-resolution masks. By utilizing novel pixel designs innovated by AUO, the use of shadow mask to manufacture small size high resolution AMOLED becomes feasible.

2. Technical Review
Recently, several major technologies that can achieve full color AMOLED are shadow mask [1], white OLED with color filter [2], inkjet printing (IJP) [3], photolithography [4], laserinducedthermal imaging (LITI) [5] and radiation-induced sublimation transfer (RIST) [6]. This section provides a brief review, discussion, and a comparison among these technologies.
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